Method of manufacturing a planar waveguide using ion exchange method
US6769274B2 · kind B2 · utility
57Cited by
8References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 26, 2001 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Jan 20, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12083
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a method of manufacturing a waveguide using an ion exchange process. The present invention controls the refractive index and the thickness of a surface layer on a glass substrate using an ion exchange process, forms the waveguide pattern on the surface layer by means of photolithography and etching process and coats with materials having the refractive index same to or lower than that of the glass substrate to form a cladding layer. Accordingly, the present invention can manufacture a planar waveguide, which is excellent in dimension control and reproducibility and has a sharp step wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.