Methods for monitoring photoresists
US6770407B2 · kind B2 · utility
2Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2002 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Mar 26, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of the invention include fluorescence microscopy inspection of an imaged resist layer prior to any type of development processing. Preferred resists for use in the methods of the invention contain a component that facilitates monitoring of a resist coating layer, particularly a component that can function as a proton acceptor and have a change in fluorescence upon exposure to radiation reemployed to pattern an image in the resist coating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.