Centralized control architecture for a plasma arc system
US6772040B1 · kind B1 · utility
62Cited by
43References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2000 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Apr 10, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/36
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.