Apparatus and method for mixing gases
US6772781B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2001 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Jan 19, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87692
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Provided are apparatuses and methods for mixing gases. The apparatuses are suitable for use in the manufacture of an electronic device. The apparatuses include a gas mixing manifold. A first, bulk gas source is connected to introduce a flow of a first gas to the manifold. A second gas source is connected to introduce a flow of a second gas to the manifold. The first and second gases are mixed in the manifold, thereby forming a gas mixture. A conduit is connected to one or more point of use for introducing a flow of the gas mixture thereto. The present invention is particularly applicable in the semiconductor manufacturing industry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.