Method of using photolithography and etching for forming a nozzle plate of an inkjet print head
US6773094B2 · kind B2 · utility
16Cited by
1References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2003 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Mar 19, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49401
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method of forming a nozzle plate of an inkjet print head. A silicon chip is provided with an activated device and a first film is formed on the silicon chip, with a first opening corresponding to the activated device. Then, a second film is formed on the first film. Next, a photoresist layer is formed on the second film, such that the photoresist layer has a second opening corresponding to the first opening. Next, the second film under the second opening of the photoresist layer is etched to form a via in the second film passing through the first opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.