Gas treatment device comprising SMSI material and methods for making and using the same
US6774080B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 25, 2002 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Nov 25, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49345
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A gas treatment device, comprises a substrate disposed within a shell. The substrate comprises a catalyst composition comprising a support, a catalyst, and a sufficient amount of SMSI material such that, upon exposure to a gas stream (at a gas treatment device operating temperature), less than or equal to about 35 wt % of hydrocarbons in the gas stream are burned.A method for forming a gas treatment device, comprises applying a slurry to a substrate, wherein the slurry comprises a support and a sufficient amount of SMSI material such that, upon exposure to a gas stream at a gas treatment device operating temperature, greater than or equal to about 50 wt % of hydrocarbons in the gas stream are cracked to a light fraction; applying a catalyst to the substrate; calcining the catalyst; and disposing the calcined substrate into a shell, with a retention material disposed between the shell and the calcined substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.