Plasma reactor and gas modification method
US6774335B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 7, 2001 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | May 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2406
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
This invention provides a plasma reactor for modifying gas by plasma, including a first planar electrode and a second planar electrode, the two electrodes facing opposite each other approximately in parallel; a dielectric body inserted between the first and the second electrodes; and a complex barrier discharge-generating way for providing a predetermined electric potential difference between the first and the second electrodes; wherein the first and the second electrodes are provided so as to apply complex plasma discharge to the gas to be treated fed between the electrodes, to thereby modify the gas. According to the invention, gas modification efficiency can be remarkably improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.