Method to avoid striae in EUV lithography mirrors
US6776006B2 · kind B2 · utility
10Cited by
59References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2001 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Nov 7, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B23/0252
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.