Cleaning method and method for manufacturing liquid crystal device
US6776853B2 · kind B2 · utility
1Cited by
7References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2001 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Jul 5, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
In a cleaning apparatus 500, as a pre-cleaning step, cleaning is performed in a first and a second backup cleaning bath 602 and 603 using a hydrocarbon-based cleaning liquid composed of a normal paraffin, such as normal nonane or normal decane, as a primary component and a surfactant such as a fatty acid alkanol amide or a fatty acid N-alkyl alkylene diamine, and as a post-cleaning step, immersion cleaning, shower cleaning, and vapor cleaning are performed in a cleaning bath 601 using a hydrocarbon-based cleaning liquid containing no surfactant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.