Patent · US Expired

Method for preparing light-absorbing polymeric compositions

US6776930B2 · kind B2 · utility

1Cited by
109References
48Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 29, 2000
Grant dateAug 17, 2004
Priority date
Expiry dateDec 29, 2020

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09B69/109
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The present invention recites a method comprising reacting in a solvent in the presence of a basea) at least one diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1200 nm and 99-0 mole % of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm, withb) an organic compound of Formula IIX—B—X1 wherein B is a divalent organic radical to form a light absorbing composition comprising a mixture of a polymer having the formula  and a cyclic compound having the general formula  wherein B is as defined above; n is at least 2, m is 1, 2, 3 or 4 and A comprises the residue of a diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1000 nm and wherein the remaining portion of A comprises the residue of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.