Method and apparatus for cleaning surfaces
US6777642B2 · kind B2 · utility
11Cited by
10References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2003 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Jan 9, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B23/505
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
This invention relates to a method and apparatus for cleaning solid surfaces like Si substrate, disk or magnetic head slider where contaminants, including organic contaminants, especially particles in the micron or sub-micron scale are effectively remove from the solid surfaces. The invention achieves this by generating a strong laser-induced liquid jet and shock wave near the solid surfaces immersed in liquid. The liquid is a solution of water and other solvents to help reduce adhesion force and enhance cleaning efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.