Organic film vapor deposition method and a scintillator panel
US6777690B2 · kind B2 · utility
15Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2000 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Dec 18, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K4/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Comprising a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from said vapor deposition table; a second step of introducing said vapor deposition table having said substrate supported by said target-support element into a vapor deposition chamber of a CVD apparatus; and a third step of depositing an organic film by CVD method onto all surfaces of said substrate, provided with said scintillator, introduced into said vapor deposition chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.