Device for specific particle manipulation and deposition

US6777880B2 · kind B2 · utility

Assignees

• Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US
• Kayser-Threde GmbH · DE

Inventors

• Gregor Morfill · Birkenfeld, DE
• Hubertus Thomas · Pfaffenhofen an der Ilm, DE
• Timo Stuffler · Landsberied, DE
• Uwe Konopka · Neufahrn, DE

Key dates

• Filing date: Mar 31, 2003
• Grant date: Aug 17, 2004
• Expiry date: Mar 31, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/32366
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and the particles are exposed in a location-selective manner to external adjustment forces and/or the plasma conditions are subjected to a location-selective change to apply at least a portion of the particles onto a substrate surface mask-free and/or subject it to a location-selective plasma treatment in the carrier or reaction gas.