System for producing patterned deposition from compressed fluid in a partially opened deposition chamber
US6780249B2 · kind B2 · utility
5Cited by
12References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2002 |
| Grant date | Aug 24, 2004 |
| Priority date | — |
| Expiry date | Dec 6, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system (10) produces patterned deposition on a substrate (14) from supercritical fluids. A delivery system (12) cooperates with a partial enclosure environment (30, 100, 200) retaining a movable substrate (14) for receiving precipitated functional material (44) along a fluid delivery path (13) from the delivery system (12). A shadow mask (22) is arranged in close proximity to the movable substrate (14) for forming the patterned deposition on the movable substrate (14).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.