Method of fabricating a suspended micro-structure with a sloped support
US6780570B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 25, 2001 |
| Grant date | Aug 24, 2004 |
| Priority date | — |
| Expiry date | Nov 20, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0157
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The method of fabricating a suspended microstructure with a sloped support, comprises the steps of (a) providing a member having three stacked up layers including a first substrate layer, a second temporary layer and a third photoresist layer; (b) photolithographically transferring a sloped pattern to the third photoresist layer by means of a grey scale mask; (c) etching the second layer through the third layer resulting from step (b) to obtain a surface with at least one continuous slope with a predetermined angle with respect to the first substrate layer; (d) depositing a fourth layer on the previous layers; (e) etching the fourth layer to obtain the sloped support; (f) (i) depositing a fifth planarization layer, (ii) depositing a sixth layer, and (iii) etching the sixth layer; and (g) removing the second layer and the fifth layer to obtain the suspended microstructure with the sloped support. The invention is also concerned with a suspended microstructure fabricated by the method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.