Direct injection accelerator method and system
US6781330B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2002 |
| Grant date | Aug 24, 2004 |
| Priority date | — |
| Expiry date | Aug 27, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H7/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An electron beam accelerator system includes a high voltage supply circuit having a high voltage output. A cathode structure is coupled to the high voltage supply circuit at the high voltage output. An anode structure is spaced from the cathode structure and has a voltage associated therewith such that a voltage difference exists between the cathode structure and the anode structure. This voltage difference creates an electron beam flowing between the cathode structure and the anode structure. An electron beam output is adjacent to the anode structure. A control grid is located between the cathode structure and the anode structure and receives a time-varying voltage. This time-varying voltage prevents ringing of the high voltage output, reducing the risk of dielectric breakdown and failure due to transient high voltages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.