X-ray topographic system
US6782076B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2001 |
| Grant date | Aug 24, 2004 |
| Priority date | — |
| Expiry date | Dec 7, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray topographic system comprises an X-ray generator producing a beam of X-rays impinging on a limited area of a sample such as a silicon wafer. A solid state detector is positioned to intercept the beam after transmission through or reflection from the sample. The detector has an array of pixels matching the beam area to produce a digital image of said limited area. Relative stepping motion between the X-ray generator and the sample produces a series of digital images which are combined together. In optional embodiments, an X-ray optic is interposed to produce a parallel beam to avoid image doubling, or the effect of image doubling is removed by software.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.