Method for manufacturing an optical device with a defined total device stress
US6782177B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 2002 |
| Grant date | Aug 24, 2004 |
| Priority date | — |
| Expiry date | Dec 2, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12169
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing an optical device with a defined total device stress and a therefrom resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. In a preferred embodiment, a lower cladding layer of an amorphous material with a first refractive index is provided and above that an upper cladding layer of an amorphous material with a second refractive index, which latter is manufactured from a material which is tunable in its stress. Between the lower and upper cladding layer an optical waveguide core is manufactured comprising an amorphous material having a third refractive index which is larger than the first and second refractive index. The optical waveguide core is thermally annealed, after which it has a defined waveguide core stress. The upper cladding layer is manufactured to have a cladding layer stress that together with the waveguide core stress results in the total device stress.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.