Methods and apparatus for cleaning and/or treating a substrate using CO2
US6782900B2 · kind B2 · utility
8Cited by
24References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2001 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | Dec 6, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for cleaning a microelectronic substrate includes a pressure chamber, a supply of a process liquid including dense phase CO2 fluidly connected to the chamber and a distilling system. Distilling system includes a still fluidly connected to the chamber and operative to separate CO2 from the process fluid. The distilling system is operative to re-introduce the separated CO2 into the chamber or a further chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.