Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing
US6783913B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2002 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | Apr 5, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polymeric acetal resins useful in lithographic printing are disclosed. The polymeric acetal resin contains units (A), (B), (C), (D), and (E). Unit (A) is a vinyl alcohol unit. Unit; (B) is a polyvinyl acetal unit containing an R group, where R is hydrogen, an aliphatic group, an aromatic group, or an arylaliphatic group. Unit (C) is a vinyl carboxylate unit. Unit (D) is an acidic vinyl acetal unit and/or a residue of an acidic vinyl monomer. Unit (E) is a free radical polymerization-inhibiting vinyl acetal unit and/or a free radical polymerization-inhibiting vinyl alcohol ester unit. The resin comprises about 10 to about 60 mol % of unit (A), about 5 to about 60 mol % of unit (B), about 0.3 to about 30 mol % of unit (C), about 1 to about 40 mol % of unit (D), and about 0.01 to about 2 mol % of unit (E).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.