Hydroxy-amino thermally cured undercoat of 193 nm lithography
US6783916B2 · kind B2 · utility
5Cited by
16References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2001 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | Jul 9, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31855
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.