Plasma filter
US6784620B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 10, 2003 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | Mar 10, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/00
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A low/band/high pass filter includes first and second plasmas, each with a path for the flow of electromagnetic energy at frequencies above the plasma frequency. A path for the flow of electromagnetic energy is coupled to the second port of the first plasma and to a first port of the second plasma. The plasma frequency of the second plasma is greater than that of the first plasma. Energy below the plasma frequency of the first plasma is reflected from the first port of the first plasma, and energy above the plasma frequency of the second plasma propagates to the second plasma. That energy above the plasma frequency of the first plasma but below the plasma frequency of the second plasma reflects from the second plasma and is coupled out of the system. That energy at a frequency above the second plasma frequency propagates through the second plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.