Full-contact type exposure device
US6784979B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 2003 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | May 22, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Full-contact exposure device that allows high adherence of a photo mask with a board. Upon completion of prescribed processing, a controller controls a moving mechanism to move a platen upward, thereby moving the photo mask and a board closer, and to stop at a position where a sealed space is formed between the two. At the same time a controller starts vacuuming by controlling a vacuum pump. By this vacuum pressure in the space between the photo mask and the board becomes negative, and the photo mask bends downward with its center area sagging and contacting the board. The controller controls a cam drive mechanism to rotate cams while vacuuming, allowing the photo mask to gradually make contact with the board from the center area to its periphery while pushing out the air gradually from the center to the periphery, thereby completing full contact with the board.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.