Coating composition for the production of insulating thin films
US6787191B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 4, 2002 |
| Grant date | Sep 7, 2004 |
| Priority date | — |
| Expiry date | Oct 4, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed is a coating composition for use in producing an insulating thin film, comprising:(A) at least one silica precursor comprised of at least one compound selected from the group consisting of an alkoxysilane and a hydrolysis product thereof;(B) at least one organic polymer;(C) water;(D) at least one alcohol; and optionally(E) an organic solvent for a mixture of the components (A), (B), (C) and (D);wherein the weight ratio (WR) of the water (C) to the at least one silica precursor (A) satisfies the formula 0.01<WR<10, and the weight of the water (C) is larger than that of the at least one alcohol (D),with the proviso that when the at least one organic polymer (B) is insoluble in a mixture of the water (C) and the alcohol (D), the coating composition comprises all of the components (A) to (E).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.