Substrate exposure apparatus
US6787813B2 · kind B2 · utility
0Cited by
3References
29Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 27, 2002 |
| Grant date | Sep 7, 2004 |
| Priority date | — |
| Expiry date | Aug 6, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/942
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate exposure apparatus, having a display apparatus and a control system. The display apparatus is used to display the pattern and to transfer the pattern to the photoresist, and includes a non-self luminescent display or a self-luminescent display. The control system is used to control the pattern displayed on the display apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.