Patent · US Expired

Data storage and processing apparatus, and method for fabricating the same

US6787825B1 · kind B1 · utility

54Cited by
6References
49Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 2, 2001
Grant dateSep 7, 2004
Priority date
Expiry dateJan 2, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B53/00
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A data storage/processing apparatus includes ROM and/or WORM and/or REWRITEABLE memory modules and/or processing modules provided as a single main layer or multiple main layers on top of a substrate. Transistors and/or diodes operate the apparatus. In one set of embodiments, at least some of the transistors and/or diodes are provided on or in the substrate. In another set of embodiments, at least some of the layers on the top of the substrate include low-temperature compatible organic materials and/or low temperature compatible processes inorganic films, and the transistors and/or diodes need not be disposed on or in the substrate. In a related fabricating method, the memory and/or processing modules are provided on the substrate by depositing the layers in successive steps under thermal conditions that avoid subjecting an already-deposited, processed underlying layers to static or dynamic temperatures exceeding given stability limits, particularly with regard to organic materials.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.