Method of fabrication of free standing shape memory alloy thin film
US6790298B2 · kind B2 · utility
58Cited by
7References
7Claims
0Family size
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Key dates
| Filing date | Jul 10, 2001 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Jul 10, 2021 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2400/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of fabricating a free standing thin film of shape memory alloy material, and products made by the methods. A sacrificial layer of a metallic material is deposited onto the surface of a substrate. Then an amorphous shape memory alloy is sputter deposited onto the outer surface of the sacrificial layer. The sacrificial layer is etched away, leaving the thin film free standing, that is separated from the substrate. The thin film is annealed by heating into a crystalline state, with the annealing step carried out either after the film has been separated from the substrate, or while remaining attached to it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.