Production of material libraries using sputter methods

US6790322B2 · kind B2 · utility

Assignee

• HTE GMBH THE HIGH THROUGHPUT EXPERIMENTATION COMPANY · DE

Inventors

• Stephan Schunk · Heidelberg, DE
• Dirk Demuth · Schallstadt, DE
• Hartmut Hibst · Schriesheim, DE

Key dates

• Filing date: Nov 13, 2002
• Grant date: Sep 14, 2004
• Expiry date: Nov 13, 2022

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C40B60/14
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

In a process for the combinatorial production of a library of materials in the form of a two-dimensional matrix in the surface region of a planar substrate by sputtering, the planar target used for the sputtering is arranged in parallel to the planar substrate and has surface regions of different chemical composition.