Light absorbing pattern film coated article production method and light absorbing pattern film coated articles
US6790583B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 22, 2001 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Dec 2, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/25
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method of producing a light absorbing pattern film coated article with a transmitted light spectrum distribution corresponding to the pattern of a photomask, wherein a light absorbing film coating solution, containing a silicon oxide raw material, a titanium oxide raw material, which contains titanium oxide microparticles, and a gold microparticle raw material, is coated onto the surface of a substrate, the photomask is positioned on top of said coated film, ultraviolet light is irradiated onto said coated film, and said coated film is thereafter heated.By the abovementioned method of producing, this invention can provide light absorbing film coated articles with various transmitted light spectra distribution while keeping the visible light reflectivity low.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.