Patent · US Expired

Fluorinated polymers, photoresists and processes for microlithography

US6790587B1 · kind B1 · utility

66Cited by

8References

66Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

Andrew Edward Feiring · Wilmington, US
Jerald Feldman · Wilmington, US
Frank Leonard Schadt, III · Wilmington, US

Key dates

Filing date	Oct 17, 2001
Grant date	Sep 14, 2004
Priority date	—
Expiry date	Oct 17, 2021

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/108
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparecy, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.