Substrate processing apparatus and semiconductor device producing method
US6790687B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 28, 2003 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Feb 28, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes a processing chamber which processes a substrate; a substrate supporting body which supports the substrate in the processing chamber; a heating member which heats the substrate and which is disposed on an opposite side from the substrate with respect to the substrate supporting body; a substrate temperature detecting device provided at a position opposed to a surface of the substrate; and a light-shielding member which shields stray light from the heating member and which is disposed around the substrate, wherein the light-shielding member has quartz members and an opaque member sandwiched between the quartz members.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.