Patent · US Expired

MEMS structure with raised electrodes

US6791742B2 · kind B2 · utility

7Cited by
8References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 3, 2003
Grant dateSep 14, 2004
Priority date
Expiry dateNov 3, 2023

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81B2201/042
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

In an electrostatically controlled deflection apparatus, such as a MEMS array having cavities formed around electrodes and which is mounted directly on a dielectric or controllably resistive substrate in which are embedded electrostatic actuation electrodes disposed in alignment with the individual MEMS elements, a mechanism is provided to mitigate the effects of uncontrolled dielectric surface potentials between the MEMS elements and the electrostatic actuation electrodes, the mechanism being raised electrodes relative to the dielectric or controllably resistive surface of the substrate. The aspect ratio of the gaps between elements (element height to element separation ratio) is at least 0.1 and preferably at least 0.5 and preferably between 0.75 and 2.0 with a typical choice of about 1.0, assuming a surface fill factor of 50% or greater. Higher aspect ratios at these fill factors are believed not to provide more than marginal improvement.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.