Laser assisted thermal poling of silica based waveguides
US6792166B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2002 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Mar 19, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/09
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of thermally poling a silica based waveguide (12) comprises exposing a region of the waveguide (12) to an electric field (for example, via capillary electrodes (22, 24) inserted into holes in the waveguide); directing a laser beam (18) into the region exposed to the electric field to effect localized heating of the region via direct absorption; and scanning the laser beam (18) over the region at a rate selected to avoid heating of the region above the glass transition temperature. Reversing the electric field while scanning the laser beam (18) allows the formation of periodic poled gratings. The waveguide (12) can comprise an optical fiber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.