Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition
US6793775B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Mar 13, 2001 |
| Grant date | Sep 21, 2004 |
| Priority date | — |
| Expiry date | Feb 15, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A plurality of glass deposition targets are rotated simultaneously and a first plasma torch, having a coil diameter larger than the sum of the target diameters, deposits glass simultaneously on the plurality. After the diameter of the targets reaches a threshold a second plasma torch is used. The diameter of the second plasma torch can provide for simultaneous deposition. In a further embodiment, after the target diameter reaches a second threshold a third plasma torch is used. In a further embodiment the spacing between the axes of rotation of the targets is widened as the target diameter increases. In a still further embodiment a single plasma torch includes movable concentric tubes within its coil to selectively operate as any of a plurality of different diameter plasma torches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.