Method and device for decontaminating optical surfaces

US6796664B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jens Luedecke · Aalen, DE
• Christoph Zazcek · Heubach, DE
• Alexandra Pazidis · Aalen, DE
• Jens Ullmann · Oberkochen, DE
• Annette Muehlpfordt · Aalen, DE
• Michael Thier · Heubach, DE
• Stefan Wiesner · Lauchheim, DE

Key dates

• Filing date: Mar 12, 2003
• Grant date: Sep 28, 2004
• Expiry date: Mar 12, 2023

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B08B7/0057
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.