Method for producing boride thin films

US6797341B2 · kind B2 · utility

Assignee

• The Penn State Research Foundation · US

Inventors

• Xianghui Zeng · Albany, US
• Alexej Pogrebnyakov · State College, US
• Xiaoxing Xi · State College, US
• Joan M. Redwing · Madison, US
• Zi-Kui Liu · State College, US
• Darrell G. Schlom · Thalwil, CH

Key dates

• Filing date: Mar 25, 2003
• Grant date: Sep 28, 2004
• Expiry date: Mar 25, 2023

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T29/49014
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Thin films of conducting and superconducting materials are formed by a process which combines physical vapor deposition with chemical vapor deposition. Embodiments include forming boride films, such as magnesium diboride, in high purity with superconducting properties on substrates typically used in the semiconductor industry by physically generating magnesium vapor in a deposition chamber and introducing a boron containing precursor into the chamber which combines with the magnesium vapor to form a thin boride film on the substrate.