Apparatus and method providing substantially two-dimensionally uniform irradiation
US6797971B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2002 |
| Grant date | Sep 28, 2004 |
| Priority date | — |
| Expiry date | Jul 18, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/067
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for providing substantially two-dimensionally uniform irradiation of a relatively large planar target surface. Each of at least two substantially identical sources of radiation irradiate the target surface. The longitudinal axes of the sources of radiation are substantially parallel with each other, defining a plane substantially parallel to the target surface. Each of the sources of radiation is within a respective elongated elliptical reflecting trough and is spaced from the focal axis of the respective trough. Each trough terminates in an opening defining a rectangular plane substantially perpendicular to the major axis of the trough and substantially parallel to the longitudinal axis of the bulb.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.