Method of forming optical thin films on substrate at high accuracy and apparatus therefor
US6798499B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2002 |
| Grant date | Sep 28, 2004 |
| Priority date | — |
| Expiry date | Jul 11, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0683
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for depositing an optical thin film at a high accuracy has a vacuum chamber in which a thin film is formed on a substrate by vapor deposition of a material at a target using ion beams from an ion gun, an optical monitor for optically measuring the thickness of the thin film and outputting transmittance data DT, a crystal monitor for measuring a frequency which changes as the deposition proceeds and for outputting frequency data DF, and a determination circuit 12. The determination circuit select between the optical monitor and the crystal monitor to control the thickness of the thin film to be formed on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.