Photoresponsive surfaces
US6800370B2 · kind B2 · utility
0Cited by
2References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2001 |
| Grant date | Oct 5, 2004 |
| Priority date | — |
| Expiry date | Feb 10, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The invention relates to an article having a photoresponsive surface, said article comprising a substrate having photoionisable moieties capable of undergoing dimerization attached to at least a portion of a surface thereof, the proximity of said moieties to one another being such that irradiation with light of an appropriate wavelength results in dimerization of at least a portion of said moieties thereby altering the wettability of the surface. Methods of preparing a substrate having a photoresistive surface and methods for altering the wettability of a surface of a substrate are also included.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.