Low-silanol silica
US6800413B2 · kind B2 · utility
19Cited by
6References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 9, 2002 |
| Grant date | Oct 5, 2004 |
| Priority date | — |
| Expiry date | Dec 5, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/12
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A silylated silica having an SiOH density per nm2 of less than 0.6, based on the BET-method surface area (DIN 66131 and 66132), is prepared by silylating silica in a process where loading, reacting, and purifying are performed in separate steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.