Patent · US Expired

Low-silanol silica

US6800413B2 · kind B2 · utility

19Cited by
6References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 9, 2002
Grant dateOct 5, 2004
Priority date
Expiry dateDec 5, 2022

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/12
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A silylated silica having an SiOH density per nm2 of less than 0.6, based on the BET-method surface area (DIN 66131 and 66132), is prepared by silylating silica in a process where loading, reacting, and purifying are performed in separate steps.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.