Management system and management method of semiconductor exposure apparatuses
US6801825B2 · kind B2 · utility
4Cited by
4References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 9, 2002 |
| Grant date | Oct 5, 2004 |
| Priority date | — |
| Expiry date | Jul 9, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70458
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A management system including a plurality of semiconductor exposure apparatuses is provided for controlling various exposures in manufacturing a semiconductor device. When plural numbers of times of exposure are performed, the management system determines a combination of semiconductor exposure apparatuses having the most appropriate exposure condition for each number of times of exposure based on a distortion generated in the semiconductor exposure apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.