Method of producing semiconductor thin film and method of producing solar cell using same
US6802926B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2001 |
| Grant date | Oct 12, 2004 |
| Priority date | — |
| Expiry date | Mar 21, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1978
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of producing a semiconductor thin film is provided. While a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. According to these methods, it is possible to peel the semiconductor thin film away from the substrate without damage and to hold the substrate without contamination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.