Structure having pores and its manufacturing method
US6804081B2 · kind B2 · utility
14Cited by
12References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 2002 |
| Grant date | Oct 12, 2004 |
| Priority date | — |
| Expiry date | Jul 4, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A structure having pores includes a first layer containing alumina, a second layer that includes at least one of Ti, Zr, Hf, Nb, Ta, Mo, W and Si, and a third layer with electrical conductivity, in this order, wherein the first and second layers have pores.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.