Preparation of thin silica films with controlled thickness and tunable refractive index
US6808742B2 · kind B2 · utility
6Cited by
4References
26Claims
0Family size
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Key dates
| Filing date | Mar 7, 2003 |
| Grant date | Oct 26, 2004 |
| Priority date | — |
| Expiry date | Mar 7, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/32
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of forming a porous silica film includes the following steps: a) providing a substrate; b) coating, on a surface of the substrate, a layer of charged polyelectrolyte; and c) applying an aged silica-bearing non-colloidal solution to the coated surface of the substrate to adsorb porous silica thereon. The adsorption cycle of steps (b) and (c) is repeated a number of times to control film thickness. The age and concentration of the silica-bearing solution are selected to control the porosity and the index of refraction of the porous silica film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.