Patterned carbon nanotube films
US6811957B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2002 |
| Grant date | Nov 2, 2004 |
| Priority date | — |
| Expiry date | Mar 15, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/896
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
This invention relates to a process for preparing a patterned layer of aligned carbon nanotubes on a substrate including: applying a photoresist layer to at least a portion of a surface of a substrate capable of supporting nanotube growth, masking a region of said photoresist layer to provide a masked portion and an unmasked portion, subjecting said unmasked portion to electromagnetic radiation of a wavelength and intensity sufficient to transform the unmasked portion while leaving the masked portion substantially untransformed, said transformed portion exhibiting solubility characteristics different to said untransformed portion, developing said photoresist layer by contacting with a solvent for a time and under conditions sufficient to dissolve one of said transformed and untransformed portions of the photoresist, leaving the other portion attached to said substrate, synthesising a layer of aligned carbon nanotubes on regions of said substrate to which said remaining photoresist portion is not attached to provide a patterned layer of aligned carbon nanotubes on said substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.