Imprint lithography utilizing room temperature embossing
US6814898B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2001 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | May 15, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/855
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of performing imprint lithography of a surface of a workpiece including a substrate, wherein a stamper/imprinter comprised of a material having thermal expansion characteristics different from the material of said substrate is utilized for embossing a desired pattern in said workpiece surface, the method comprising conducting the embossing at room temperature in order to avoid deleterious effects arising from differences in thermal expansion/contraction characteristics between the stamper/imprinter and the workpiece which occur during conventional imprinting at elevated temperatures. Embodiments of the invention include forming servo patterns in disk-shaped substrates utilized in the manufacture of hard disk magnetic recording media.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.