System and method for chemical analysis using laser ablation
US6815671B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2003 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | Jul 3, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/162
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for chemically analyzing single particles in a high velocity gas flow. The system comprises an ion source chamber having a gas inlet and outlet, and a high-energy, pulsed, ultraviolet laser for ablating the single particles in the high velocity gas flow entering the ion source chamber through the gas inlet to produce positively- and negatively-charged ions. The system further includes a first extraction plate for extracting the positively-charged ions provided in the ion source chamber, and a second extraction plate for extracting the negatively-charged ions provided in the ion source chamber. The positively-charged ions are injected into a first ion mobility spectrometer where they are detected and characterized. The negatively-charged ions are injected into a second ion mobility spectrometer where they are detected and characterized. The dual ion mobility spectrometers configuration of the present invention permits characterization of both the positively- and negatively-charged ions from a single gas particle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.