Patent · US Expired

Vertical bipolar transistor and a method of manufacture therefor including two epitaxial layers and a buried layer

US6815801B2 · kind B2 · utility

4Cited by
16References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 28, 2003
Grant dateNov 9, 2004
Priority date
Expiry dateFeb 28, 2023

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/673

Abstract

The present invention provides a vertical bipolar transistor 110, a method of manufacture therefor, and an integrated circuit including the same. The vertical bipolar transistor 110 may include, in one embodiment, a second epitaxial layer 140 located over a first epitaxial layer 130, wherein the second epitaxial layer includes at least two dopant profiles 143, 147. The vertical bipolar transistor 110 may further include a collector 154, a base 156 and an emitter 158 located over or within the second epitaxial layer 140.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.