Vertical bipolar transistor and a method of manufacture therefor including two epitaxial layers and a buried layer
US6815801B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2003 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | Feb 28, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/673
Abstract
The present invention provides a vertical bipolar transistor 110, a method of manufacture therefor, and an integrated circuit including the same. The vertical bipolar transistor 110 may include, in one embodiment, a second epitaxial layer 140 located over a first epitaxial layer 130, wherein the second epitaxial layer includes at least two dopant profiles 143, 147. The vertical bipolar transistor 110 may further include a collector 154, a base 156 and an emitter 158 located over or within the second epitaxial layer 140.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.