Electron source having planar emission region and focusing structure
US6815875B2 · kind B2 · utility
5Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 27, 2001 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | Jun 11, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/308
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An electron source includes a planar emission region for generating an electron emission, and a focusing structure for focusing the electron emission into an electron beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.