Systems and methods for amplified optical metrology
US6816264B1 · kind B1 · utility
8Cited by
3References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 21, 2001 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | Aug 27, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/02007
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A spectrometer may include a radiant source configured to emit radiation and an optical amplifier configured to amply the radiation emitted by the radiant source to produce amplified radiation. A number of optical elements may be configured to produce an interference pattern from the amplified radiation. A detector may detect the interference pattern and generate data from the interference pattern. A processor may be configured to measure one or more from the data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.